In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
In this white paper we present a suite of plasma processing tools for FA with the aim of providing practical guidance as to their suitability for different tasks. One way of uncovering a fault and ...
Add Yahoo as a preferred source to see more of our stories on Google. Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again ...
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
Trymax Semiconductor B.V. provides plasma-based etching, stripping, and curing process equipment for advanced semiconductor packaging, targeting applications in dry descum, ashing, surface preparation ...
We demonstrate a mass-production amenable technology for fabrication, surface modification and multifunction integration in plastic, disposable microfluidic devices, namely direct lithography on the ...
FORT COLLINS, Colo., May 17, 2017 (GLOBE NEWSWIRE) -- Advanced Energy Industries, Inc. (AEIS), a global leader in precision power conversion, announced today that its solid-state matching network has ...
“Plasma” refers to a gas with a significant proportion of ionized molecules, which produce various excited ions, atoms, and molecules. Electrons liberated from ions and atoms are highly energetic and ...
The year 1981 was notable for a variety of technology breakthroughs. It saw the inaugural mission of the Space Shuttle Columbia and the debut of the DeLorean car. The IBM PC, Commodore 64, and the ...
What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...
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