San Francisco — Applied Materials Inc. took a big step into the high-k/metal-gate arena last week, rolling out a trio of tools for advanced gate-stack and related applications at 45 nanometers. Intel ...

The IC industry is headed toward a new era of scaling–and uncertainty–as chip makers race to develop the key building blocks for the next-generation transistor: high-k dielectrics and metal gates.

We actually did a gate design for that client and other pieces that create a theme throughout their house,” Wasser says. The high-style interior color finishes and durable exterior finishes come from ...

In logic devices such as finFETs (field-effect transistors), metal gate parasitic capacitance can negatively impact electrical performance. One way to reduce this parasitic capacitance is to optimize ...

Dynamic Random Access Memory (DRAM) serves as the backbone of modern computing, enabling devices ranging from smartphones to high-performance servers. As the demand accelerates for higher density and ...