A recently developed block copolymer could help push the limits of integration and miniaturization in semiconductor manufacturing, report scientists. Chemically tailored for reliable directed ...

(Nanowerk News) Miniaturization is one of the fundamental qualities of modern electronics and is largely responsible for the incredible increments in performance witnessed over the past decades. To ...

Block copolymer thin films lie at the forefront of nanomaterials research, merging precise molecular design with self-assembly processes to yield highly ordered nanostructures. By utilising chemically ...

A new technical paper titled “Directed self-assembly of block copolymers for high-precision patterning in the era of extreme ultraviolet lithography” was published by researchers at University of ...

A review in the Chinese Journal of Polymer Science ("Unconventional 2D Periodic Nanopatterns Based on Block Molecules") addresses these issues by leveraging the unique properties of block molecules, ...

“Directed self-assembly (DSA) of block copolymers (BCPs) has long been included in the semiconductor roadmap as a lithographic pathway to enable continued device scaling. Tremendous progress has been ...